英语语法分析

Exposure dose should be changed with the thickness of SU-8 photoresist.

根据SU - 8胶的厚度确定曝光剂量的大小。

A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.

氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。

Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.

通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。