英语语法分析

In this paper, micro vision was used to make measurements on the feature size of photomask.

利用显微视觉技术对光掩模的特征尺寸进行了测量。

In order to repair the clear defects of photomask, photolytic LCVD process is required to initiate the chemical reactions.

为了对透明光掩模亮场区域进行修补，需要光化学解离过程诱导反应发生；

So the measurement and control in the feature size of photomask can reduce the reject of IC and research on this area is very meaningful.

对掩模特征尺寸及缺陷进行检测可以减少集成电路的废品率，因此开展这方面的研究具有重要意义。