英语语法分析

Photoetching polysilicon forms force sensitive resistance bar.

多晶硅经光刻后便形成力敏电阻条。

Photoetching device, mirror element, device producing method and beam transfering system.

光刻装置，镜元件，器件制造方法，及束传送系统。

Aligning method, aligning substrate, photoetching device and component manufacturing method.

对准方法，对准基底，光刻装置和器件制造方法。